Journal: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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Abbreviation
J. Vac. Sci. Technol. B
Publisher
American Institute of Physics
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Publications 1 - 10 of 14
- Effect of reverse flow by differential pressure on the protection of critical surfaces against particle contaminationItem type: Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaKim, Jung H.; Fissan, Heinz; Asbach, Christof; et al. (2006) - Full scale simulation of a field-emitter arrays based electron source for free-electron lasersItem type: Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaDehler, M.; Candel, A.; Gjonaj, E. (2006) - Bit-array patterns with density over 1 Tbit/in.2 fabricated by extreme ultraviolet interference lithographyItem type: Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaSolak, Harun H.; Ekinci, Yasin (2007) - Fabrication of Fresnel zone plates by holography in the extreme ultraviolet regionItem type: Conference Paper
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaSarkar, Sankha S.; Sahoo, Pratap K.; Solak, Harun H.; et al. (2008) - In situ characterization of block copolymer ordering on chemically nanopatterned surfaces by time-resolved small angle x-ray scatteringItem type: Conference Paper
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaStuen, K. O.; Liu, C.; Welander, A. M.; et al. (2008) - Assessing the performance of two-dimensional dopant profiling techniquesItem type: Conference Paper
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaDuhayon, N.; Eyben, P.; Fouchier, M.; et al. (2004) - Detailed analysis of the influence of an inductively coupled plasma reactive-ion etching process on the hole depth and shape of photonic crystals in InP/InGaAsPItem type: Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaStrasser, P.; Wüest, R.; Robin, F.; et al. (2007) - Accuracy of scanning capacitance microscopy for the delineation of electrical junctionsItem type: Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaStangoni, Maria; Ciappa, Mauro; Fichtner, Wolfgang (2004) - Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystalsItem type: Journal Article
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaCallegari, Victor; Nellen, P. M.; Kaufmann, J.; et al. (2007) - Fabrication of elastomer pillar arrays with modulated stiffness for cellular force measurementsItem type: Other Conference Item
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and PhenomenaGhassemi, S.; Biais, N.; Maniura, K.; et al. (2008)
Publications 1 - 10 of 14