Engineering the grain boundary network of thin films via ion-irradiation: Towards improved electromigration resistance
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Author / Producer
Date
2017-01
Publication Type
Journal Article
ETH Bibliography
yes
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Publication status
published
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Book title
Journal / series
Volume
123
Pages / Article No.
272 - 284
Publisher
Elsevier
Event
Edition / version
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Date collected
Date created
Subject
Electromigration; Grain boundary engineering; Ion-irradiation; Microstructure design; Thin films
Organisational unit
03692 - Spolenak, Ralph / Spolenak, Ralph
Notes
Received 27 May 2016, Revised 14 September 2016, Accepted 16 October 2016, Published online 29 October 2016.