Measuring stresses in thin metal films by means of Raman microscopy using silicon as a strain gage material
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Author / Producer
Date
2009
Publication Type
Journal Article
ETH Bibliography
yes
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Rights / License
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Publication status
published
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Book title
Journal / series
Volume
40 (12)
Pages / Article No.
1849 - 1857
Publisher
Wiley
Event
Edition / version
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Software
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Date collected
Date created
Subject
Raman microscopy; grain growth; thin film; silicon; thermal stresses
Organisational unit
03692 - Spolenak, Ralph / Spolenak, Ralph
Notes
Received 3 February 2009, Accepted 28 March 2009, Published Online 26 May 2009.