Plasmonic films can easily be better: Rules and recipes
OPEN ACCESS
Author / Producer
Date
2015-03-18
Publication Type
Journal Article
ETH Bibliography
yes
Citations
Altmetric
OPEN ACCESS
Data
Rights / License
Abstract
High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper. Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting performance unnecessarily. This is then compounded as others follow their published procedures. In this perspective, we describe simple rules collected from the surface-science literature that allow high-quality plasmonic films of aluminum, copper, gold, and silver to be easily deposited with commonly available equipment (a thermal evaporator). Recipes are also provided so that films with optimal optical properties can be routinely obtained.
Permanent link
Publication status
published
External links
Editor
Book title
Journal / series
Volume
2 (3)
Pages / Article No.
326 - 333
Publisher
American Chemical Society
Event
Edition / version
Methods
Software
Geographic location
Date collected
Date created
Subject
Aluminum; Copper; Deposition; Dielectric function; Gold; Plasmonics; Relative permittivity; Silver
Organisational unit
03875 - Norris, David J. / Norris, David J.