Modeling and optimization of atomic layer deposition processes on vertically aligned carbon nanotubes
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Date
2014-03-05
Publication Type
Journal Article
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yes
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Abstract
Many energy conversion and storage devices exploit structured ceramics with large interfacial surface areas. Vertically aligned carbon nanotube (VACNT) arrays have emerged as possible scaffolds to support large surface area ceramic layers. However, obtaining conformal and uniform coatings of ceramics on structures with high aspect ratio morphologies is non-trivial, even with atomic layer deposition (ALD). Here we implement a diffusion model to investigate the effect of the ALD parameters on coating kinetics and use it to develop a guideline for achieving conformal and uniform thickness coatings throughout the depth of ultra-high aspect ratio structures. We validate the model predictions with experimental data from ALD coatings of VACNT arrays. However, the approach can be applied to predict film conformality as a function of depth for any porous topology, including nanopores and nanowire arrays.
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Publication status
published
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Journal / series
Volume
5
Pages / Article No.
234 - 244
Publisher
Beilstein-Institut zur Förderung der Chemischen Wissenschaften
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Edition / version
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Software
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Date collected
Date created
Subject
Atomic layer deposition; Vertically aligned carbon nanotubes; Continuum diffusion model; Conformal coating guidelines; Titania; TiO2
Organisational unit
03895 - Wood, Vanessa / Wood, Vanessa
03843 - Park, Hyung Gyu (ehemalig) / Park, Hyung Gyu (former)