Plasma Polymerization of Acrylic Acid Revisited
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Date
2009
Publication Type
Journal Article
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yes
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Abstract
To perform a systematic study over a broad parameter range of acrylic acid discharges, we varied the energy input W/F over a wide range. Five different regimes could be identified (from low to high energy input): regime I, where oligomerization takes place; regime II, the radical‐dominated plasma polymerization of acrylic acid; regime III, a transition regime showing etching/oxidation effects; regime IV, where the plasma polymerization resembles the one observed for CO₂/C₂H₄ discharges; and regime V, where etching effects yield a reduction in deposition rate. These results show that the polymerization mechanism can be described as a function of the energy input W/F. Specifically, a parameter range where acrylic acid can be replaced by CO₂/C₂H₄ discharges has been identified.
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published
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Volume
6 (4)
Pages / Article No.
246 - 254
Publisher
Wiley
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Subject
Acrylic acid; Deposition rate; Plasma polymerization; Processing parameter; RF plasma