PECVD of SıOx films from oxygen and hexamethyldisiloxane in a double source reactor
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Author / Producer
Date
2006
Publication Type
Doctoral Thesis
ETH Bibliography
yes
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Rights / License
Permanent link
Publication status
published
External links
Editor
Contributors
Examiner : Spencer, Nicholas D.
Examiner : Rudolf von Rohr, Philipp
Book title
Journal / series
Volume
Pages / Article No.
Publisher
ETH
Event
Edition / version
Methods
Software
Geographic location
Date collected
Date created
Subject
SILICON OXIDES (INORGANIC CHEMISTRY); SILICIUMOXIDE (ANORGANISCHE CHEMIE); EIGENSCHAFTEN DÜNNER SCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN); CHEMICAL VAPOUR DEPOSITION, CVD (PRODUCTION ENGINEERING); PROPERTIES OF THIN LAYERS (PHYSICS OF MOLECULAR SYSTEMS); CHEMISCHE BESCHICHTUNGEN AUS DER GASPHASE, CVD (PRODUKTIONSTECHNIK)
Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)