Assessing the performance of two-dimensional dopant profiling techniques
METADATA ONLY
Author / Producer
Date
2004-01
Publication Type
Conference Paper
ETH Bibliography
yes
Citations
Altmetric
METADATA ONLY
Data
Rights / License
Permanent link
Publication status
published
External links
Editor
Book title
Volume
22 (1)
Pages / Article No.
385 - 393
Publisher
American Institute of Physics
Event
7th International Workshop on the Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors