Fabrication of a hard mask for InP based photonic crystals
Increasing the plasma-etch selectivity of poly(methyl methacrylate) versus SiO2 and SiNx
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Author / Producer
Date
2005-11
Publication Type
Conference Paper
ETH Bibliography
yes
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Publication status
published
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Book title
Volume
23 (6)
Pages / Article No.
3197 - 3201
Publisher
American Institute of Physics
Event
49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
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Organisational unit
03386 - Jäckel, Heinz (emeritus)
03262 - Bächtold, Werner (emeritus)
03472 - Professur für Feldtheorie (ehemalig)
Notes
Published online 7 December 2005.