Effect of Substrate Temperature and RF Biasing on the Optical Properties of Titania-Like Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition
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Author / Producer
Date
2009
Publication Type
Conference Paper
ETH Bibliography
yes
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published
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Journal / series
Volume
6 (S1)
Pages / Article No.
Publisher
Wiley-VCH
Event
11th International Conference on Plasma Surface Engineering (PSE 2008)
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Date created
Subject
films; plasma enhanced chemical vapor deposition (PE-CVD); RF self biasing; substrate temperature; surface; TiOx films; UV absorption
Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
Notes
Received 14 September 2008, Accepted 24 May 2009, Published Online 13 August 2009.