Noise Tailoring in Memristive Filaments
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Date
2021-02-17
Publication Type
Journal Article
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Abstract
In this study, the possibilities of noise tailoring in filamentary resistive switching memory devices are investigated. To this end, the resistance and frequency scaling of the low-frequency 1/f-type noise properties are studied in representative mainstream material systems. It is shown that the overall noise floor is tailorable by the proper material choice, as demonstrated by the order-of-magnitude smaller noise levels in Ta2O5 and Nb2O5 transition-metal oxide memristors compared to Ag-based devices. Furthermore, the variation of the resistance states allows orders-of-magnitude tuning of the relative noise level in all of these material systems. This behavior is analyzed in the framework of a point-contact noise model highlighting the possibility for the disorder-induced suppression of the noise contribution arising from remote fluctuators. These findings promote the design of multipurpose resistive switching units, which can simultaneously serve as analog-tunable memory elements and tunable noise sources in probabilistic computing machines.
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published
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Journal / series
Volume
13 (6)
Pages / Article No.
7453 - 7460
Publisher
American Chemical Society
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Date collected
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Subject
Resistive switching memory; Memristor; Niobium pentoxide; Tantalum pentoxide; Silver sulfide; Noise; Atomic fluctuation; Two-level system
Organisational unit
02635 - Institut für Elektromagnetische Felder / Institute of Electromagnetic Fields