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dc.contributor.author
Jayanti, Sriharsha V.
dc.contributor.author
Park, Jong Hyuk
dc.contributor.author
Dejneka, Alexandr
dc.contributor.author
Chvostova, Dagmar
dc.contributor.author
McPeak, Kevin M.
dc.contributor.author
Chen, Xiaoshu
dc.contributor.author
Oh, Sang-Hyun
dc.contributor.author
Norris, David J.
dc.date.accessioned
2017-06-11T17:45:18Z
dc.date.available
2017-06-11T17:45:18Z
dc.date.issued
2015
dc.identifier.other
10.1364/OME.5.001147
dc.identifier.uri
http://hdl.handle.net/20.500.11850/101434
dc.language.iso
en
dc.publisher
OSA
dc.title
Low-temperature enhancement of plasmonic performance in silver films
dc.type
Journal Article
ethz.journal.title
Optical Materials Express
ethz.journal.volume
5
ethz.journal.issue
5
ethz.pages.start
1147
ethz.pages.end
1155
ethz.notes
Received 2 March 2015, Accepted 30 March 2015, Published 21 April 2015.
ethz.identifier.wos
ethz.identifier.nebis
010006875
ethz.publication.place
Washington
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03875 - Norris, David J. / Norris, David J.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03875 - Norris, David J. / Norris, David J.
ethz.date.deposited
2017-06-11T17:45:47Z
ethz.source
ECIT
ethz.identifier.importid
imp593653390258097958
ethz.ecitpid
pub:159236
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-13T17:40:06Z
ethz.rosetta.lastUpdated
2018-11-02T19:12:29Z
ethz.rosetta.versionExported
true
ethz.COinS
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