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dc.contributor.author
Biswas, Pratim
dc.contributor.author
Li, Xiaoming
dc.contributor.author
Pratsinis, Sotiris E.
dc.date.accessioned
2017-06-11T17:48:02Z
dc.date.available
2017-06-11T17:48:02Z
dc.date.issued
1989-03
dc.identifier.issn
0021-8979
dc.identifier.issn
1089-7550
dc.identifier.other
10.1063/1.342814
dc.identifier.uri
http://hdl.handle.net/20.500.11850/101507
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Optical Waveguide Preform Fabrication: Silica Formation and Growth in a High Temperature Reactor
dc.type
Journal Article
ethz.journal.title
Journal of Applied Physics
ethz.journal.volume
65
ethz.journal.abbreviated
J. appl. physi.
ethz.pages.start
2445
ethz.pages.end
2450
ethz.notes
.
ethz.identifier.nebis
000037502
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03510 - Pratsinis, Sotiris E. / Pratsinis, Sotiris E.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik / Institute of Process Engineering::03510 - Pratsinis, Sotiris E. / Pratsinis, Sotiris E.
ethz.date.deposited
2017-06-11T17:48:47Z
ethz.source
ECIT
ethz.identifier.importid
imp5936533ab3fd159332
ethz.ecitpid
pub:159314
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-13T14:23:23Z
ethz.rosetta.lastUpdated
2018-04-01T05:55:57Z
ethz.rosetta.exportRequired
true
ethz.rosetta.versionExported
true
ethz.COinS
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