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dc.contributor.author
Shih, Chih-Jen
dc.contributor.author
Fang, C.H.
dc.contributor.author
Lu, C.C.
dc.contributor.author
Wang, M.H.
dc.contributor.author
Lee, M.H.
dc.contributor.author
Lan, C.W.
dc.date.accessioned
2017-06-11T17:51:33Z
dc.date.available
2017-06-11T17:51:33Z
dc.date.issued
2006
dc.identifier.issn
0021-8979
dc.identifier.issn
1089-7550
dc.identifier.other
10.1063/1.2245193
dc.identifier.uri
http://hdl.handle.net/20.500.11850/101646
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Phase field modeling of excimer laser crystallization of thin silicon films on amorphous substrates
dc.type
Journal Article
ethz.journal.title
Journal of Applied Physics
ethz.journal.volume
100
ethz.journal.issue
5
ethz.journal.abbreviated
J. appl. physi.
ethz.pages.start
053504
ethz.size
9 p.
ethz.notes
.
ethz.identifier.nebis
000037502
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02516 - Inst. f. Chemie- und Bioingenieurwiss. / Inst. Chemical and Bioengineering::09502 - Shih, Chih-Jen / Shih, Chih-Jen
ethz.date.deposited
2017-06-11T17:51:57Z
ethz.source
ECIT
ethz.identifier.importid
imp5936533e1093493781
ethz.ecitpid
pub:159455
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T21:01:59Z
ethz.rosetta.lastUpdated
2018-11-02T19:17:36Z
ethz.rosetta.versionExported
true
ethz.COinS
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