Show simple item record

dc.contributor.author
Gambino, Nadia
dc.contributor.author
Rollinger, Bob
dc.contributor.author
Hudgins, Duane
dc.contributor.author
Abhari, Reza S.
dc.contributor.author
Abreau, F.
dc.contributor.editor
Cain, Jason P.
dc.contributor.editor
Sanchez, Martha I.
dc.date.accessioned
2017-06-11T17:57:44Z
dc.date.available
2017-06-11T17:57:44Z
dc.date.issued
2015
dc.identifier.isbn
978-1-6284-1526-1
dc.identifier.issn
0277-786X
dc.identifier.other
10.1117/12.2085806
dc.identifier.uri
http://hdl.handle.net/20.500.11850/101836
dc.language.iso
en
dc.publisher
SPIE
dc.subject
Droplet target
dc.subject
Laser produced plasma
dc.subject
VUV spectroscopy
dc.subject
Optical inspection
dc.title
Spectral emission properties of a LPP light source in the sub-200nm range for wafer inspection applications
dc.type
Conference Paper
ethz.book.title
Metrology, Inspection, and Process Control for Microlithography XXIX
ethz.journal.title
Proceedings of SPIE
ethz.journal.volume
9424
ethz.journal.abbreviated
Proc. SPIE Int. Soc. Opt. Eng.
ethz.pages.start
942418
ethz.size
8 p.
ethz.event
29th Conference on Metrology, Inspection, and Process Control for Microlithography
ethz.event.location
San José, CA, USA
ethz.event.date
February 23-26, 2015
ethz.notes
.
ethz.identifier.wos
ethz.identifier.nebis
010489818
ethz.publication.place
Bellingham, WA
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology::03548 - Abhari, Reza S. / Abhari, Reza S.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology::03548 - Abhari, Reza S. / Abhari, Reza S.
ethz.date.deposited
2017-06-11T17:58:14Z
ethz.source
ECIT
ethz.identifier.importid
imp593653425331389109
ethz.ecitpid
pub:159939
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T17:50:22Z
ethz.rosetta.lastUpdated
2018-11-02T19:20:45Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=Spectral%20emission%20properties%20of%20a%20LPP%20light%20source%20in%20the%20sub-200nm%20range%20for%20wafer%20inspection%20applications&rft.jtitle=Proceedings%20of%20SPIE&rft.date=2015&rft.volume=9424&rft.spage=942418&rft.issn=0277-786X&rft.au=Gambino,%20Nadia&Rollinger,%20Bob&Hudgins,%20Duane&Abhari,%20Reza%20S.&Abreau,%20F.&rft.isbn=978-1-6284-1526-1&rft.genre=proceeding&rft_id=info:doi/978-1-6284-1526-1&rft.btitle=Metrology,%20Inspection,%20and%20Process%20Control%20for%20Microlithography%20XXIX
 Search via SFX

Files in this item

FilesSizeFormatOpen in viewer

There are no files associated with this item.

Publication type

Show simple item record