Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications
- Journal Article
Journal / seriesMicroelectronic Engineering
SubjectEUV lithography; Soft X-ray lithography; Technology node; Silicon nanowires; Nanofabrication; Synchrotron beamline
NotesReceived 31 October 2014, Revised 18 March 2015, Accepted 24 March 2015, Published online 28 March 2015.
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