Deposition of SiO2 films from different organosilicon/O2 plasmas under continuous wave and pulsed modes
Metadata only
Datum
2001-07Typ
- Conference Paper
ETH Bibliographie
yes
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Publikationsstatus
publishedExterne Links
Zeitschrift / Serie
Surface and Coatings TechnologyBand
Seiten / Artikelnummer
Verlag
ElsevierKonferenz
Thema
Plasma-enhanced chemical vapor deposition; Microwave; Pulsed plasma; Tetraethoxysilane; HexamethyldisiloxaneOrganisationseinheit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ETH Bibliographie
yes
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