Deposition of SiO2 films from different organosilicon/O2 plasmas under continuous wave and pulsed modes

Metadata only

Autor(in)

Datum

2001-07

Typ

Conference Paper

ETH Bibliographie

yes

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Publikationsstatus

published

Externe Links

Zeitschrift / Serie

Surface and Coatings Technology

Band

142-144

Seiten / Artikelnummer

649 - 654

Verlag

Elsevier

Konferenz

7th International Conference On Plasma Surface Engineering, Garmisch-Partenkirchen, Deutschland, September 17-21, 2000

Thema

Plasma-enhanced chemical vapor deposition; Microwave; Pulsed plasma; Tetraethoxysilane; Hexamethyldisiloxane

Organisationseinheit

03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)

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ETH Bibliographie

yes

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