Deposition of SiO2 films from different organosilicon/O2 plasmas under continuous wave and pulsed modes

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Author
Bapin, E.
Rudolf von Rohr, Philipp
Date
2001-07
Type
    Conference Paper
Publication status
published
External links
Journal / series
Surface and Coatings Technology
Volume
142-144
Pages / Article No.
649 - 654
Publisher
Elsevier
Event
7th International Conference On Plasma Surface Engineering, Garmisch-Partenkirchen, Deutschland, September 17-21, 2000
Subject
Plasma-enhanced chemical vapor deposition; Microwave; Pulsed plasma; Tetraethoxysilane; Hexamethyldisiloxane
Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)  
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