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dc.contributor.author
Bapin, E.
dc.contributor.author
Rudolf von Rohr, Philipp
dc.date.accessioned
2017-06-11T19:03:15Z
dc.date.available
2017-06-11T19:03:15Z
dc.date.issued
2001-07
dc.identifier.other
10.1016/S0257-8972(01)01072-6
dc.identifier.uri
http://hdl.handle.net/20.500.11850/103577
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
Plasma-enhanced chemical vapor deposition
dc.subject
Microwave
dc.subject
Pulsed plasma
dc.subject
Tetraethoxysilane
dc.subject
Hexamethyldisiloxane
dc.title
Deposition of SiO2 films from different organosilicon/O2 plasmas under continuous wave and pulsed modes
dc.type
Conference Paper
ethz.journal.title
Surface and Coatings Technology
ethz.journal.volume
142-144
ethz.pages.start
649
ethz.pages.end
654
ethz.event
7th International Conference On Plasma Surface Engineering
ethz.event.location
Garmisch-Partenkirchen, Deutschland
ethz.event.date
September 17-21, 2000
ethz.identifier.nebis
000035352
ethz.publication.place
Amsterdam
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.date.deposited
2017-06-11T19:04:10Z
ethz.source
ECIT
ethz.identifier.importid
imp5936536ad129681620
ethz.ecitpid
pub:161828
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-13T12:22:54Z
ethz.rosetta.lastUpdated
2021-02-14T13:13:14Z
ethz.rosetta.versionExported
true
ethz.COinS
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