Alpha- vs. beta-W nanocrystalline thin films: A comprehensive study of sputter parameters and resulting materials' properties - Research Collection

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Author

Vüllers, F.T.N.

Spolenak, Ralph

Date

2015

Type

Journal Article

Citations

Cited 19 times in Web of Science

ETH Bibliography

yes

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Publication status

published

External links

https://doi.org/10.1016/j.tsf.2015.01.030

Journal / series

Thin Solid Films

Volume

577

Pages / Article No.

26 - 34

Publisher

Elsevier

Subject

Sputter deposition; Tungsten; Thin films; Nanocrystalline; X-ray diffraction; Resistivity; Direct-current substrate bias; Crystalline phase

Organisational unit

03692 - Spolenak, Ralph / Spolenak, Ralph

Notes

.

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Show all metadata

Citations

Cited 19 times in Web of Science

ETH Bibliography

yes

Altmetrics