Alpha- vs. beta-W nanocrystalline thin films: A comprehensive study of sputter parameters and resulting materials' properties

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Author
Vüllers, F.T.N.
Spolenak, Ralph
Date
2015
Type
    Journal Article
Publication status
published
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Journal / series
Thin Solid Films
Volume
577
Pages / Article No.
26 - 34
Publisher
Elsevier
Subject
Sputter deposition; Tungsten; Thin films; Nanocrystalline; X-ray diffraction; Resistivity; Direct-current substrate bias; Crystalline phase
Organisational unit
03692 - Spolenak, Ralph / Spolenak, Ralph  
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