Effect of Substrate Temperature and RF Biasing on the Optical Properties of Titania-Like Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition

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Author

Date

2009

Type

Conference Paper

ETH Bibliography

yes

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Publication status

published

External links

Journal / series

Plasma Processes and Polymers

Volume

6(S1)

Pages / Article No.

S722 - S726

Publisher

Wiley-VCH

Event

11th International Conference on Plasma Surface Engineering (PSE 2008), Garmisch-Patenkirchen, Germany, September 15-19, 2008

Subject

films; plasma enhanced chemical vapor deposition (PE-CVD); RF self biasing; substrate temperature; surface; TiOx films; UV absorption

Organisational unit

03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)

Notes

Received 14 September 2008, Accepted 24 May 2009, Published Online 13 August 2009.

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