Effect of Substrate Temperature and RF Biasing on the Optical Properties of Titania-Like Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition

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Autor(in)
Sonnenfeld, Axel
Rudolf von Rohr, Philipp
Datum
2009
Typ
    Conference Paper
Publikationsstatus
published
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Zeitschrift / Serie
Plasma Processes and Polymers
Band
6(S1)
Seiten / Artikelnummer
S722 - S726
Verlag
Wiley-VCH
Konferenz
11th International Conference on Plasma Surface Engineering (PSE 2008), Garmisch-Patenkirchen, Germany, September 15-19, 2008
Thema
films; plasma enhanced chemical vapor deposition (PE-CVD); RF self biasing; substrate temperature; surface; TiOx films; UV absorption
Organisationseinheit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)  
Anmerkungen
Received 14 September 2008, Accepted 24 May 2009, Published Online 13 August 2009.
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