Controlled Deposition of NIST-traceable Nanoparticles as Additional Size Standards for Photomask Applications

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Author
Wang, Jing
Pui, David Y.H.
Yook, Se-Jin
Fissan, Heinz
Ultanir, Erdem
Liang, Ted
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Date
2008
Type
  • Conference Paper
Publication status
published
External links
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Editor
Allgair, John A.
Raymond, Christopher J.
Book title
Metrology, Inspection, and Process Control for Microlithography XXII
Journal / series
Proceedings of SPIE
Volume
6922
Pages / Article No.
69220G
Publisher
SPIE
Event
Metrology, Inspection, and Process Control for Microlithography XXII, San Jose, California, USA, February 25-28, 2008
Subject
Particle standard; Surface inspection tools; Electrostatic deposition; NIST-traceable size
Organisational unit
03887 - Wang, Jing / Wang, Jing  
Notes
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Citations
Cited 1 times in Web of Science
ETH Bibliography
no
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