Show simple item record

dc.contributor.author
Wang, Jing
dc.contributor.author
Pui, David Y.H.
dc.contributor.author
Yook, Se-Jin
dc.contributor.author
Fissan, Heinz
dc.contributor.author
Ultanir, Erdem
dc.contributor.author
Liang, Ted
dc.contributor.editor
Allgair, John A.
dc.contributor.editor
Raymond, Christopher J.
dc.date.accessioned
2017-06-12T01:00:50Z
dc.date.available
2017-06-12T01:00:50Z
dc.date.issued
2008
dc.identifier.isbn
978-0-8194-7107-9
dc.identifier.issn
0277-786X
dc.identifier.other
10.1117/12.756741
dc.identifier.uri
http://hdl.handle.net/20.500.11850/113084
dc.language.iso
en
dc.publisher
SPIE
dc.subject
Particle standard
dc.subject
Surface inspection tools
dc.subject
Electrostatic deposition
dc.subject
NIST-traceable size
dc.title
Controlled Deposition of NIST-traceable Nanoparticles as Additional Size Standards for Photomask Applications
dc.type
Conference Paper
ethz.book.title
Metrology, Inspection, and Process Control for Microlithography XXII
ethz.journal.title
Proceedings of SPIE
ethz.journal.volume
6922
ethz.journal.abbreviated
Proc. SPIE Int. Soc. Opt. Eng.
ethz.pages.start
69220G
ethz.size
10 p.
ethz.event
Metrology, Inspection, and Process Control for Microlithography XXII
ethz.event.location
San Jose, California, USA
ethz.event.date
February 25-28, 2008
ethz.identifier.nebis
009856759
ethz.publication.place
Bellingham, WA
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02115 - Dep. Bau, Umwelt und Geomatik / Dep. of Civil, Env. and Geomatic Eng.::02608 - Institut für Umweltingenieurwiss. / Institute of Environmental Engineering::03887 - Wang, Jing / Wang, Jing
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02115 - Dep. Bau, Umwelt und Geomatik / Dep. of Civil, Env. and Geomatic Eng.::02608 - Institut für Umweltingenieurwiss. / Institute of Environmental Engineering::03887 - Wang, Jing / Wang, Jing
ethz.date.deposited
2017-06-12T01:05:36Z
ethz.source
ECIT
ethz.identifier.importid
imp5936542074c5f12425
ethz.ecitpid
pub:174748
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T20:47:33Z
ethz.rosetta.lastUpdated
2021-02-14T13:59:26Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=Controlled%20Deposition%20of%20NIST-traceable%20Nanoparticles%20as%20Additional%20Size%20Standards%20for%20Photomask%20Applications&rft.jtitle=Proceedings%20of%20SPIE&rft.date=2008&rft.volume=6922&rft.spage=69220G&rft.issn=0277-786X&rft.au=Wang,%20Jing&Pui,%20David%20Y.H.&Yook,%20Se-Jin&Fissan,%20Heinz&Ultanir,%20Erdem&rft.isbn=978-0-8194-7107-9&rft.genre=proceeding&rft_id=info:doi/10.1117/12.756741&rft.btitle=Metrology,%20Inspection,%20and%20Process%20Control%20for%20Microlithography%20XXII
 Search print copy at ETH Library

Files in this item

FilesSizeFormatOpen in viewer

There are no files associated with this item.

Publication type

Show simple item record