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dc.contributor.author
Ladosz, Agnieszka
dc.contributor.author
Rigger, Eugen
dc.contributor.author
Rudolf von Rohr, Philipp
dc.date.accessioned
2023-07-24T15:07:25Z
dc.date.available
2017-06-12T01:58:46Z
dc.date.available
2023-07-24T15:07:25Z
dc.date.issued
2016-03
dc.identifier.issn
1613-4982
dc.identifier.issn
1613-4990
dc.identifier.other
10.1007/s10404-016-1712-7
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/113712
dc.identifier.doi
10.3929/ethz-b-000113712
dc.description.abstract
In this paper we present a model for the calculation of pressure drop of three-phase liquid–liquid–gas slug flow in microcapillaries of a circular cross section. Introduced models consist of terms attributing for frictional and interfacial pressure drop, incorporating the presence of a stagnant thin film at the wall of the channel. Different formulations of the interfacial pressure drop equation were employed, using expressions developed by Bretherton (J Fluid Mech 10:166–188, 1961), Warnier et al. (Microfluid Nanofluid 8:33–45, 2010) or Ratulowski and Chang (Phys Fluids A 1:1642–1655, 1989). Models were validated experimentally using oleic acid–water–nitrogen and heptane–water–nitrogen three-phase flows in round Teflon or Radel R microchannels of 254- and 508-µm nominal inner diameter, for capillary numbers Ca b between 10−4 and 4.9 × 10−1 and Reynolds numbers Re between 0.095 and 300. Best agreement between measured and calculated values of pressure drop, with relative error between −22 and 19 % or −20 and 16 %, is reached for Warnier’s or Ratulowski and Chang’s interfacial pressure drop equation, respectively. The results prove that three-phase slug flow pressure drop can be successfully predicted by extending existing two-phase slug flow correlations. Good agreement of Bretherton’s equation was reached only at lower Ca numbers, indicating that an extension of the interfacial pressure drop equation as performed by Warnier et al. (Microfluid Nanofluid 8:33–45, 2010) or Ratulowski and Chang (Phys Fluids A 1:1642–1655, 1989) for higher capillary numbers is necessary. Additionally it was demonstrated that pressure drop increases substantially if dry slug flow occurs or if microchannels with significant surface roughness are employed. Those influences were not accounted for in the models presented.
en_US
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
Springer
en_US
dc.rights.uri
http://rightsstatements.org/page/InC-NC/1.0/
dc.subject
Multiphase flow
en_US
dc.subject
Three-phase flow
en_US
dc.subject
Liquid–liquid–gas
en_US
dc.subject
Slug flow
en_US
dc.subject
Microchannel
en_US
dc.subject
Pressure drop
en_US
dc.subject
Surface roughness
en_US
dc.title
Pressure drop of three-phase liquid-liquid-gas slug flow in round microchannels
en_US
dc.type
Journal Article
dc.rights.license
In Copyright - Non-Commercial Use Permitted
dc.date.published
2016-02-29
ethz.journal.title
Microfluidics and Nanofluidics
ethz.journal.volume
20
en_US
ethz.journal.issue
3
en_US
ethz.journal.abbreviated
Microfluid Nanofluid
ethz.pages.start
49
en_US
ethz.size
14 p.
en_US
ethz.version.deposit
publishedVersion
en_US
ethz.notes
It was possible to publish this article open access thanks to a Swiss National Licence with the publisher.
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.identifier.nebis
005053051
ethz.publication.place
Berlin
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.date.deposited
2017-06-12T02:00:31Z
ethz.source
ECIT
ethz.identifier.importid
imp5936542d8253f86098
ethz.ecitpid
pub:175441
ethz.eth
yes
en_US
ethz.availability
Open access
en_US
ethz.rosetta.installDate
2017-07-15T02:36:35Z
ethz.rosetta.lastUpdated
2024-02-03T01:55:12Z
ethz.rosetta.versionExported
true
ethz.COinS
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