Evidence for faster etching at the mask-substrate interface: atomistic simulation of complex cavities at the micron-/submicron-scale by the continuous cellular automaton

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Author
Gosalvez, Miguel A.
Ferrando, N.
Fedoryshyn, Y.
Leuthold, J.
McPeak, K.M.
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Date
2016
Type
  • Journal Article
Publication status
published
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Journal / series
Journal of Micromechanics and Microengineering
Volume
26(4)
Pages / Article No.
045013
Publisher
Institute of Physics
Organisational unit
03974 - Leuthold, Juerg  
Notes
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Citations
Cited 1 times in Web of Science
ETH Bibliography
yes
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