Evidence for faster etching at the mask-substrate interface: atomistic simulation of complex cavities at the micron-/submicron-scale by the continuous cellular automaton - Research Collection

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Author

Gosalvez, Miguel A.

Leuthold, Juerg

Date

2016

Type

Journal Article

Citations

Cited 5 times in Web of Science

Cited 5 times in Scopus

ETH Bibliography

yes

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Publication status

published

External links

https://doi.org/10.1088/0960-1317/26/4/045013

Journal / series

Journal of Micromechanics and Microengineering

Volume

26(4)

Pages / Article No.

045013

Publisher

Institute of Physics

Organisational unit

03974 - Leuthold, Juerg / Leuthold, Juerg

More

Show all metadata

Citations

Cited 5 times in Web of Science

Cited 5 times in Scopus

ETH Bibliography

yes

Altmetrics