Evidence for faster etching at the mask-substrate interface: atomistic simulation of complex cavities at the micron-/submicron-scale by the continuous cellular automaton
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Date
2016Type
- Journal Article
Publication status
publishedJournal / series
Journal of Micromechanics and MicroengineeringVolume
Pages / Article No.
Publisher
Institute of PhysicsOrganisational unit
03974 - Leuthold, Juerg / Leuthold, Juerg
Notes
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