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dc.contributor.author
Bracchi, A.
dc.contributor.author
Samwer, K.
dc.contributor.author
Schneider, S.
dc.contributor.author
Löffler, Jörg F.
dc.date.accessioned
2017-06-12T08:16:03Z
dc.date.available
2017-06-12T08:16:03Z
dc.date.issued
2003-02
dc.identifier.issn
0003-6951
dc.identifier.issn
1077-3118
dc.identifier.other
10.1063/1.1544430
dc.identifier.uri
http://hdl.handle.net/20.500.11850/117837
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Random anisotropy and domain-wall pinning process in the magnetic properties of rapidly quenched Nd60Fe30Al10
dc.type
Journal Article
ethz.journal.title
Applied Physics Letters
ethz.journal.volume
82
ethz.journal.issue
5
ethz.journal.abbreviated
Appl. Phys. Lett.
ethz.pages.start
721
ethz.pages.end
723
ethz.notes
Received 16 October 2002, Accepted 16 December 2002, Published online 28 January 2003.
ethz.identifier.nebis
000038985
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03661 - Löffler, Jörg F. / Löffler, Jörg F.
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::02645 - Institut für Metallforschung / Institute of Metals Research::03661 - Löffler, Jörg F. / Löffler, Jörg F.
ethz.date.deposited
2017-06-12T08:21:57Z
ethz.source
ECIT
ethz.identifier.importid
imp593654811a78225710
ethz.ecitpid
pub:179765
ethz.eth
no
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-12T20:55:54Z
ethz.rosetta.lastUpdated
2019-02-02T07:25:52Z
ethz.rosetta.exportRequired
true
ethz.rosetta.versionExported
true
ethz.COinS
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