Strain Engineering in Highly Mismatched SiGe/Si Heterostructures

Isa, Fabio; Jung, Arik; Salvalaglio, Marco; Arroyo Rojas Dasilva, Yadira; Marozau, Ivan; Meduňa, Mojmír; Barget, Michael; Marzegalli, Anna; Isella, Giovanni; Erni, Rolf; Pezzoli, Fabio; Bonera, Emiliano; Niedermann, Philippe; Sereda, Olha; Sereda, Olha; Montalenti, Francesco; von Känel, Hans

doi:10.1016/j.mssp.2016.08.019

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Author

Isa, Fabio

Jung, Arik

Salvalaglio, Marco

Arroyo Rojas Dasilva, Yadira

Montalenti, Francesco

von Känel, Hans

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Date

2017-11-01

Type

Journal Article

Citations

Cited 10 times in Scopus

ETH Bibliography

yes

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Publication status

published

External links

https://doi.org/10.1016/j.mssp.2016.08.019

Journal / series

Materials Science in Semiconductor Processing

Volume

70

Pages / Article No.

117 - 122

Publisher

Pergamon

Subject

Strain engineering; Dislocations; Elastic relaxation; Patterned substrates; SiGe

Organisational unit

03569 - Batlogg, Bertram (emeritus)

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Show all metadata

Citations

Cited 10 times in Scopus

ETH Bibliography

yes

Altmetrics

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