Die Quantenempfindlichkeit der Uranyloxalatphotolyse

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Author
Büchi, Paul Felix
Date
1924
Type
  • Doctoral Thesis
Rights / license
In Copyright - Non-Commercial Use Permitted
Permanent link
https://doi.org/10.3929/ethz-a-000099659
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Contributors
Examiner: Baur, Emil
Examiner: Treadwell, William D.
Journal / series
Sammelband ETH-BIB
Publisher
ETH Zürich
Subject
URANVERBINDUNGEN (ANORGANISCHE CHEMIE); OXALSÄURE + OXALATE + OXALSÄURESTICKSTOFFDERIVATE + OXALSÄURESCHWEFELDERIVATE (ALIPHATISCHE POLYCARBONSÄUREN); PHOTOLYSE (PHOTOCHEMIE); URANIUM COMPOUNDS (INORGANIC CHEMISTRY); OXALIC ACID + OXALATES + OXALIC ACID NITROGEN DERIVATIVES + OXALIC ACID SULFUR DERIVATIVES (ALIPHATIC POLYCARBOXYLIC ACIDS); PHOTOLYSIS (PHOTOCHEMISTRY)
Notes
SA aus: Zeitschrift für physikalische Chemie, Band 111, Heft 3-4, S.269-314. Diss. Techn.Wiss. ETH Zürich, Nr. 372, 1924. Ref.: Baur, E. ; Korref.: Treadwell, W.D..
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