Metastability in digital circuits with emphasis on CMOS technology
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Date
1989Type
- Doctoral Thesis
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https://doi.org/10.3929/ethz-a-000510400Publication status
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Contributors
Supervisor: Birolini, AlessandroSupervisor: Guggenbühl, Walter
Publisher
ETH ZürichSubject
METALLOXID-HALBLEITER-INTEGRIERTE SCHALTUNGEN, MOS (MIKROELEKTRONIK); DIGITALSPEICHER + DIGITALREGISTER (ELEKTRISCHE INFORMATIONSSPEICHER); FELDEFFEKTTRANSISTOREN, FET (ELEKTRONIK); KOMPLEMENTÄRE METALLOXID-HALBLEITERSCHALTUNGEN, CMOS (MIKROELEKTRONIK); DIGITALE INTEGRIERTE SCHALTUNGEN (MIKROELEKTRONIK); METAL OXIDE SEMICONDUCTOR INTEGRATED CIRCUITS, MOS (MICROELECTRONICS); DIGITAL MEMORIES + DIGITAL REGISTERS (ELECTRICAL INFORMATION STORAGE DEVICES); FIELD EFFECT TRANSISTORS, FET (ELECTRONICS); COMPLEMENTARY-METAL-OXIDE-SEMICONDUCTOR CIRCUITS, CMOS (MICROELECTRONICS); DIGITAL INTEGRATED CIRCUITS (MICROELECTRONICS)Notes
Diss. Techn. Wiss. ETH Zürich, Nr. 8888, 1989. Ref.: W. Guggenbühl ; Korref.: A. Birolini.More
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