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dc.contributor.author
Kunz, Thilo
dc.contributor.supervisor
Wokaun, Alexander
dc.contributor.supervisor
Zenobi, Renato
dc.date.accessioned
2017-06-13T02:06:13Z
dc.date.available
2017-06-13T02:06:13Z
dc.date.issued
1997
dc.identifier.uri
http://hdl.handle.net/20.500.11850/143077
dc.identifier.doi
10.3929/ethz-a-001790338
dc.language.iso
de
dc.publisher
ETH Zürich
dc.rights.uri
http://rightsstatements.org/page/InC-NC/1.0/
dc.subject
EXCIMERLASER (LASERTECHNIK)
dc.subject
LASERABLATION (LASERTECHNIK)
dc.subject
PHOTOCHEMISCHE UMWANDLUNG VON POLYMEREN + PHOTOREAKTIVE POLYMERE
dc.subject
PHOTORESIST VERFAHREN (PHOTOGRAPHIE)
dc.subject
EXCIMER LASERS (LASER ENGINEERING)
dc.subject
LASER ABLATIONS (LASER ENGINEERING)
dc.subject
PHOTOCHEMICAL TRANSFORMATION OF POLYMERS + PHOTOREACTIVE POLYMERS
dc.subject
PHOTORESIST PROCESSES (PHOTOGRAPHY)
dc.title
Excimerlaser-Ablation von Polymeren und photochemische Untersuchungen an Modellsubstanzen
dc.type
Doctoral Thesis
dc.rights.license
In Copyright - Non-Commercial Use Permitted
ethz.size
133 S.
ethz.code.ddc
6 - Technology, medicine and applied sciences::621.3 - Electric engineering
ethz.notes
Diss. Techn. Wiss. ETH Zürich, Nr. 12076, 1997. Ref.: A. Wokaun ; Korref.: R. Zenobi.
ethz.identifier.diss
12076
ethz.identifier.nebis
001790338
ethz.publication.place
Zürich
ethz.date.deposited
2017-06-13T02:07:08Z
ethz.source
ECOL
ethz.identifier.importid
imp59366a0ed820b87300
ethz.ecolpid
eth:40714
ethz.eth
yes
ethz.availability
Closed access
ethz.rosetta.installDate
2017-07-26T18:13:22Z
ethz.rosetta.lastUpdated
2018-03-01T08:33:05Z
ethz.rosetta.versionExported
true
ethz.COinS
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