Controlling diffusion for rapid formation of interconnects

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Author
Sobol, Karolina Krystyna
Date
2014
Type
    Doctoral Thesis
Rights / license
In Copyright - Non-Commercial Use Permitted
Permanent link
https://doi.org/10.3929/ethz-a-010186591
Publication status
published
External links
Search print copy at ETH Library
Contributors
Examiner: Janczak-Rusch, Jolanta
Examiner: Spolenak, Ralph
Publisher
ETH-Zürich
Subject
BREITBANDHALBLEITER, WBS (HALBLEITERTECHNOLOGIE); DIFFUSION (PHYSIK VON MOLEKULARSYSTEMEN); EIGENSCHAFTEN DÜNNER SCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN); KUPFER (CHEMISCHE ELEMENTE); ZINN (CHEMISCHE ELEMENTE); WIDE BAND GAP SEMICONDUCTORS, WBS (SEMICONDUCTOR TECHNOLOGY); DIFFUSION (PHYSICS OF MOLECULAR SYSTEMS); PROPERTIES OF THIN LAYERS (PHYSICS OF MOLECULAR SYSTEMS); COPPER (CHEMICAL ELEMENTS); TIN (CHEMICAL ELEMENTS)
Organisational unit
02160 - Dep. Materialwissenschaft / Dep. of Materials
03692 - Spolenak, Ralph / Spolenak, Ralph
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