High-resolution laser lithography system based on two-dimensional acousto-optic deflection
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Date
2009Type
- Journal Article
ETH Bibliography
yes
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Publication status
publishedExternal links
Journal / series
Review of Scientific InstrumentsVolume
Pages / Article No.
Publisher
American Institute of PhysicsSubject
acousto-optical effects; beam steering; micromechanical resonators; photolithography; photonic crystals; photoresists; semiconductor lasersOrganisational unit
03255 - Günter, Peter
Notes
Received 30 April 2009, Accepted 19 July 2009, Published 19 August 2009.More
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ETH Bibliography
yes
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