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dc.contributor.author
Sigrist, M.
dc.contributor.author
Fuhrer, A.
dc.contributor.author
Ihn, T.
dc.contributor.author
Ensslin, K.
dc.contributor.author
Driscoll, D. C.
dc.contributor.author
Gossard, A. C.
dc.date.accessioned
2017-06-14T18:59:50Z
dc.date.available
2017-06-14T18:59:50Z
dc.date.issued
2004-10-18
dc.identifier.issn
0003-6951
dc.identifier.issn
1077-3118
dc.identifier.other
10.1063/1.1809273
dc.identifier.uri
http://hdl.handle.net/20.500.11850/160259
dc.language.iso
en
dc.publisher
American Institute of Physics
dc.title
Multiple layer local oxidation for fabricating semiconductor nanostructures
dc.type
Journal Article
ethz.journal.title
Applied Physics Letters
ethz.journal.volume
85
ethz.journal.issue
16
ethz.journal.abbreviated
Appl. phys. lett.
ethz.pages.start
3558
ethz.pages.end
3560
ethz.notes
Received 25 March 2004, Accepted 2 September 2004.
ethz.identifier.wos
ethz.identifier.nebis
000038985
ethz.publication.place
Melville, NY
ethz.publication.status
published
ethz.date.deposited
2017-06-14T19:05:22Z
ethz.source
ECIT
ethz.identifier.importid
imp59364e76adbeb76550
ethz.ecitpid
pub:65241
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-15T06:04:57Z
ethz.rosetta.lastUpdated
2018-11-05T11:24:12Z
ethz.rosetta.versionExported
true
ethz.COinS
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