High mobility SiGe heterostructures fabricated by low-energy plasma-enhanced chemical vapor deposition
dc.contributor.author
Känel, H. von
dc.contributor.author
Chrastina, D.
dc.contributor.author
Rössner, B.
dc.contributor.author
Isella, G.
dc.contributor.author
Hague, J.P.
dc.contributor.author
Bollani, M.
dc.date.accessioned
2017-06-14T19:07:42Z
dc.date.available
2017-06-14T19:07:42Z
dc.date.issued
2004-10
dc.identifier.issn
0167-9317
dc.identifier.issn
1873-5568
dc.identifier.other
10.1016/j.mec.2004.07.029
dc.identifier.uri
http://hdl.handle.net/20.500.11850/160309
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
Silicon germanium (SiGe)
dc.subject
Virtual substrate
dc.subject
Relaxed buffer
dc.subject
MODFET
dc.title
High mobility SiGe heterostructures fabricated by low-energy plasma-enhanced chemical vapor deposition
dc.type
Conference Paper
ethz.journal.title
Microelectronic Engineering
ethz.journal.volume
76
ethz.journal.issue
1-4
ethz.journal.abbreviated
Microelectron. eng.
ethz.pages.start
279
ethz.pages.end
284
ethz.event
European Workshop on Materials for Advanced Metallization (MAM2004)
ethz.event.location
Brussels, Belgium
ethz.event.date
March 07-10, 2004
ethz.identifier.wos
ethz.identifier.nebis
000022878
ethz.publication.place
Amsterdam
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich, direkt::00012 - Lehre und Forschung, direkt::00007 - Departemente, direkt::02010 - Departement Physik / Department of Physics::02505 - Laboratorium für Festkörperphysik (LFP) / Laboratory for Solid State Physics (LFP)::03569 - Batlogg, Bertram (emeritus)
ethz.date.deposited
2017-06-14T19:16:43Z
ethz.source
ECIT
ethz.identifier.importid
imp59364e77a813261250
ethz.ecitpid
pub:65295
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-15T03:58:50Z
ethz.rosetta.lastUpdated
2018-08-02T22:52:57Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=High%20mobility%20SiGe%20heterostructures%20fabricated%20by%20low-energy%20plasma-enhanced%20chemical%20vapor%20deposition&rft.jtitle=Microelectronic%20Engineering&rft.date=2004-10&rft.volume=76&rft.issue=1-4&rft.spage=279&rft.epage=284&rft.issn=0167-9317&1873-5568&rft.au=K%C3%A4nel,%20H.%20von&Chrastina,%20D.&R%C3%B6ssner,%20B.&Isella,%20G.&Hague,%20J.P.&rft.genre=proceeding&rft_id=info:doi/10.1016/j.mec.2004.07.029&
Files in this item
| Files | Size | Format | Open in viewer |
|---|---|---|---|
|
There are no files associated with this item. |
|||
Publication type
-
Conference Paper [35269]