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dc.contributor.author
Reichen, Patrick
dc.contributor.author
Sonnenfeld, Axel
dc.contributor.author
Rudolf von Rohr, Philipp
dc.date.accessioned
2017-06-14T19:22:21Z
dc.date.available
2017-06-14T19:22:21Z
dc.date.issued
2011-09-30
dc.identifier.issn
0963-0252
dc.identifier.issn
1361-6595
dc.identifier.other
10.1088/0963-0252/20/5/055015
dc.identifier.uri
http://hdl.handle.net/20.500.11850/160453
dc.language.iso
en
dc.publisher
Institute of Physics
dc.subject
Surfaces
dc.subject
Interfaces and thin films
dc.subject
Plasma physics
dc.title
Discharge expansion in barrier discharge arrangements at low applied voltages
dc.type
Journal Article
ethz.journal.title
Plasma sources science & technology
ethz.journal.volume
20
ethz.journal.issue
5
ethz.journal.abbreviated
Plasma sources sci. technol. (Print)
ethz.pages.start
055015
ethz.size
8 p.
ethz.notes
Received 4 March 2011, Revised 10 August 2011.
ethz.identifier.wos
ethz.identifier.scopus
ethz.identifier.nebis
00642080
ethz.publication.place
Bristol
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02629 - Institut für Verfahrenstechnik (ehem.) / Institute of Process Engineering (form)::03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)
ethz.date.deposited
2017-06-14T19:28:14Z
ethz.source
ECIT
ethz.identifier.importid
imp59364e7a389b931557
ethz.ecitpid
pub:65544
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-25T10:53:20Z
ethz.rosetta.lastUpdated
2021-02-14T17:20:49Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=Discharge%20expansion%20in%20barrier%20discharge%20arrangements%20at%20low%20applied%20voltages&rft.jtitle=Plasma%20sources%20science%20&%20technology&rft.date=2011-09-30&rft.volume=20&rft.issue=5&rft.spage=055015&rft.issn=0963-0252&1361-6595&rft.au=Reichen,%20Patrick&Sonnenfeld,%20Axel&Rudolf%20von%20Rohr,%20Philipp&rft.genre=article&rft_id=info:doi/10.1088/0963-0252/20/5/055015&
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