Fluorine clustering and diffusion in silicon
- Conference Paper
Journal / seriesJournal of vacuum science & technology. Series 2. B
Pages / Article No.
PublisherAmerican Institute of Physics
Subjectab initio calculations; boron; diffusion; elemental semiconductors; fluorine; Monte Carlo methods; silicon
NotesReceived 10 June 2009, Accepted 29 September 2009, Published 3 March 2010.
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