The role of Si incorporation on the anodic growth of barrier-type Al oxide

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Author
Cancellieri, Claudia
Evangelisti, Fabio
Geldmacher, T.
Araullo-Peters, Vicente
Ott, Noémie
Chiodi, Mirco
Döbeli, Max
Schmutz, Patrik
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Date
2017-12
Type
    Journal Article
Publication status
published
External links
Journal / series
Materials Science and Engineering: B
Volume
226
Pages / Article No.
120 - 131
Publisher
Elsevier
Subject
Al-alloys; Anodic oxides; PVD; Si inclusion; Defects; Microstructure
Organisational unit
08619 - Labor für Ionenstrahlphysik (LIP) / Laboratory of Ion Beam Physics (LIP)  
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Citations
Cited 5 times in Web of Science
Cited 4 times in Scopus
ETH Bibliography
yes
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