Influence of the Gas Phase on the Water Vapor Barrier Properties of SiOx Films Deposited from RF and Dual-Mode Plasmas

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Author
Sonnenfeld, Axel
Bieder, Andrea
Rudolf von Rohr, Philipp
Date
2006-10
Type
    Journal Article
Publication status
published
External links
Journal / series
Plasma Processes and Polymers
Volume
3(8)
Pages / Article No.
606 - 617
Publisher
Wiley-VCH
Subject
Langmuir probe (LP); Optical emission spectroscopy (OES); Plasma enhanced chemical vapor deposition (PE-CVD); Silicon oxide; Water vapor transmission rate
Organisational unit
03348 - Rudolf von Rohr, Philipp (emeritus) / Rudolf von Rohr, Philipp (emeritus)  
Notes
Received 8 November 2005, Revised 13 June 2006, Accepted 23 June 2006, Published online 29 September 2006.
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