Optical Properties of Nitrogen-Substituted Strontium Titanate Thin Films Prepared by Pulsed Laser Deposition
dc.contributor.author
Marozau, Ivan
dc.contributor.author
Shkabko, Andrey
dc.contributor.author
Döbeli, Max
dc.contributor.author
Lippert, Thomas
dc.contributor.author
Logvinovich, Dimitri
dc.contributor.author
Mallepell, Marc
dc.contributor.author
Schneider, Christof W.
dc.contributor.author
Weidenkaff, Anke
dc.contributor.author
Wokaun, Alexander
dc.date.accessioned
2019-06-20T15:16:13Z
dc.date.available
2017-06-09T00:05:47Z
dc.date.available
2019-06-20T15:16:13Z
dc.date.issued
2009-09
dc.identifier.issn
1996-1944
dc.identifier.other
10.3390/ma2031388
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/21057
dc.identifier.doi
10.3929/ethz-b-000021057
dc.description.abstract
Perovskite-type N-substituted SrTiO3 thin films with a preferential (001) orientation were grown by pulsed laser deposition on (001)-oriented MgO and LaAlO3 substrates. Application of N2 or ammonia using a synchronized reactive gas pulse produces SrTiO3-x:Nx films with a nitrogen content of up to 4.1 at.% if prepared with the NH3 gas pulse at a substrate temperature of 720 °C. Incorporating nitrogen in SrTiO3 results in an optical absorption at 370-460 nm associated with localized N(2p) orbitals. The estimated energy of these levels is ≈2.7 eV below the conduction band. In addition, the optical absorption increases gradually with increasing nitrogen content.
en_US
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
MDPI
en_US
dc.rights.uri
http://creativecommons.org/licenses/by-nc-sa/3.0/
dc.subject
Oxynitrides
en_US
dc.subject
strontium titanate
en_US
dc.subject
pulsed laser deposition
en_US
dc.subject
thin films
en_US
dc.subject
optical properties
en_US
dc.title
Optical Properties of Nitrogen-Substituted Strontium Titanate Thin Films Prepared by Pulsed Laser Deposition
en_US
dc.type
Journal Article
dc.rights.license
Creative Commons Attribution-NonCommercial-ShareAlike 3.0 Unported
dc.date.published
2009-09-22
ethz.journal.title
Materials
ethz.journal.volume
2
en_US
ethz.journal.issue
3
en_US
ethz.pages.start
1388
en_US
ethz.pages.end
1401
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ethz.version.deposit
publishedVersion
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ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02513 - Laboratorium für Anorganische Chemie / Laboratory of Inorganic Chemistry
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02010 - Dep. Physik / Dep. of Physics::02532 - Institut für Teilchen- und Astrophysik / Inst. Particle Physics and Astrophysics::08619 - Labor für Ionenstrahlphysik (LIP) / Laboratory of Ion Beam Physics (LIP)
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02516 - Inst. f. Chemie- und Bioingenieurwiss. / Inst. Chemical and Bioengineering::03421 - Wokaun, Alexander (emeritus)
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02010 - Dep. Physik / Dep. of Physics::02532 - Institut für Teilchen- und Astrophysik / Inst. Particle Physics and Astrophysics::08619 - Labor für Ionenstrahlphysik (LIP) / Laboratory of Ion Beam Physics (LIP)
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02020 - Dep. Chemie und Angewandte Biowiss. / Dep. of Chemistry and Applied Biosc.::02516 - Inst. f. Chemie- und Bioingenieurwiss. / Inst. Chemical and Bioengineering::03421 - Wokaun, Alexander (emeritus)
ethz.date.deposited
2017-06-09T00:05:53Z
ethz.source
ECIT
ethz.identifier.importid
imp59364cc45a89e28422
ethz.ecitpid
pub:33680
ethz.eth
yes
en_US
ethz.availability
Open access
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ethz.rosetta.installDate
2017-07-17T10:08:09Z
ethz.rosetta.lastUpdated
2024-02-02T08:21:20Z
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true
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true
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