Crystal plasticity in Cu damascene interconnect lines undergoing electromigration as revealed by synchrotron x-ray microdiffraction
Publication status
publishedExternal links
Journal / series
Applied Physics LettersVolume
Pages / Article No.
Publisher
American Institute of PhysicsSubject
Copper; X-ray diffraction; Voids (solid); Plasticity; Bending; Dislocations; Plastic flow; Point defects; Integrated circuit interconnectionsOrganisational unit
03692 - Spolenak, Ralph / Spolenak, Ralph
Notes
Received 1 February 2006, Accepted 10 May 2006, Published online 9 June 2006.More
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yes
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