Investigation of the local Ge concentration in Si/SiGe nanostructures by convergent-beam electron diffraction
dc.contributor.author
Ruh, E.
dc.contributor.author
Mueller, E.
dc.contributor.author
Mussler, G.
dc.contributor.author
Sigg, H. C.
dc.contributor.author
Gruetzmacher, D.
dc.date.accessioned
2017-06-09T06:16:53Z
dc.date.available
2017-06-09T06:16:53Z
dc.date.issued
2010
dc.identifier.other
10.1016/j.ultramic.2010.05.003
dc.identifier.uri
http://hdl.handle.net/20.500.11850/24401
dc.language.iso
en
dc.publisher
Elsevier
dc.subject
CBED
dc.subject
SiGe
dc.subject
Multi quantum well
dc.subject
HOLZ line
dc.subject
Thin foil relaxation
dc.subject
Local concentration
dc.title
Investigation of the local Ge concentration in Si/SiGe nanostructures by convergent-beam electron diffraction
dc.type
Journal Article
ethz.journal.title
Ultramicroscopy
ethz.journal.volume
110
ethz.journal.issue
10
ethz.pages.start
1255
ethz.pages.end
1266
ethz.notes
Received 20 September 2009, Revised 7 May 2010, Accepted 11 May 2010, Available online 16 May 2010.
ethz.identifier.wos
ethz.identifier.nebis
000017677
ethz.publication.place
Amsterdam
ethz.publication.status
published
ethz.date.deposited
2017-06-09T06:16:56Z
ethz.source
ECIT
ethz.identifier.importid
imp59364d259c7a627157
ethz.ecitpid
pub:39809
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-14T18:40:22Z
ethz.rosetta.lastUpdated
2018-08-02T06:31:49Z
ethz.rosetta.versionExported
true
ethz.COinS
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