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dc.contributor.author
Šeniutinas, Gediminas
dc.contributor.author
Weber, Anja
dc.contributor.author
Padeste, Celestino
dc.contributor.author
Sakellari, Ioanna
dc.contributor.author
Farsari, Maria
dc.contributor.author
David, Christian
dc.date.accessioned
2018-04-12T05:51:43Z
dc.date.available
2018-02-28T09:10:17Z
dc.date.available
2018-02-22T04:32:54Z
dc.date.available
2018-02-28T09:22:48Z
dc.date.available
2018-04-12T05:51:43Z
dc.date.issued
2018-05-05
dc.identifier.issn
0167-9317
dc.identifier.issn
1873-5568
dc.identifier.other
10.1016/j.mee.2018.01.018
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/244844
dc.language.iso
en
en_US
dc.publisher
Elsevier
en_US
dc.subject
3D laser lithography
en_US
dc.subject
Laser polymerization
en_US
dc.subject
Pyrolysis
en_US
dc.subject
Plasma etching
en_US
dc.title
Beyond 100 nm resolution in 3D laser lithography — Post processing solutions
en_US
dc.type
Journal Article
dc.date.published
2018-02-02
ethz.journal.title
Microelectronic Engineering
ethz.journal.volume
191
en_US
ethz.journal.abbreviated
Microelectron. eng.
ethz.pages.start
25
en_US
ethz.pages.end
31
en_US
ethz.identifier.scopus
ethz.publication.place
Amsterdam
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::03997 - Heyderman, Laura / Heyderman, Laura
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02160 - Dep. Materialwissenschaft / Dep. of Materials::03997 - Heyderman, Laura / Heyderman, Laura
en_US
ethz.date.deposited
2018-02-22T04:33:06Z
ethz.source
FORM
ethz.source
SCOPUS
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2018-02-28T09:22:51Z
ethz.rosetta.lastUpdated
2018-11-06T17:45:58Z
ethz.rosetta.versionExported
true
dc.identifier.olduri
http://hdl.handle.net/20.500.11850/244841
dc.identifier.olduri
http://hdl.handle.net/20.500.11850/243044
ethz.COinS
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