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dc.contributor.author
Viarbitskaya, Sviatlana
dc.contributor.author
Arocas, Juan
dc.contributor.author
Heintz, Olivier
dc.contributor.author
Colas-Des-Francs, Gérard
dc.contributor.author
Rusakov, D.
dc.contributor.author
Koch, Ueli
dc.contributor.author
Leuthold, Juerg
dc.contributor.author
Markey, Laurent
dc.contributor.author
Dereux, Alain
dc.contributor.author
Weeber, And J.C.
dc.date.accessioned
2018-04-27T16:07:31Z
dc.date.available
2018-04-27T05:13:09Z
dc.date.available
2018-04-27T16:07:31Z
dc.date.issued
2018-04-16
dc.identifier.other
10.1364/OE.26.009813
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/261013
dc.language.iso
en
en_US
dc.publisher
Optical Society of America
en_US
dc.title
Correlation between electrical direct current resistivity and plasmonic properties of CMOS compatible titanium nitride thin films
en_US
dc.type
Journal Article
ethz.journal.title
Optics Express
ethz.journal.volume
26
en_US
ethz.journal.issue
8
en_US
ethz.pages.start
9813
en_US
ethz.pages.end
9821
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.publication.place
Washington D.C.
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::02635 - Institut für Elektromagnetische Felder / Electromagnetic Fields Laboratory::03974 - Leuthold, Juerg / Leuthold, Juerg
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::02635 - Institut für Elektromagnetische Felder / Electromagnetic Fields Laboratory::03974 - Leuthold, Juerg / Leuthold, Juerg
ethz.date.deposited
2018-04-27T05:13:12Z
ethz.source
SCOPUS
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2018-04-27T16:07:33Z
ethz.rosetta.lastUpdated
2019-02-02T16:54:30Z
ethz.rosetta.versionExported
true
ethz.COinS
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