Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

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Autor(in)

Datum

2010

Typ

Conference Paper

ETH Bibliographie

yes

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Publikationsstatus

published

Externe Links

Zeitschrift / Serie

Microelectronic Engineering

Band

87(5-8)

Seiten / Artikelnummer

1052 - 1056

Verlag

Elsevier

Konferenz

35th International Conference on Micro- and Nano-Engineering (MNE), Ghent, Belgium, September 28 - October 1, 2009

Thema

High aspect ratio; PMMA; Electron beam lithography; X-ray optics; Hard X-rays; Au electroplating

Organisationseinheit

03817 - Stampanoni, Marco F.M. / Stampanoni, Marco F.M.

Anmerkungen

Received 11 September 2009, Revised 13 November 2009, Accepted 17 November 2009, Available online 23 November 2009.

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ETH Bibliographie

yes

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