Influence of HCl etching on the electronic properties of LAO-defined nanostructures
dc.contributor.author
Schleser, R.
dc.contributor.author
Kicin, S.
dc.contributor.author
Roth, C.
dc.contributor.author
Ebneter, C.
dc.contributor.author
Leturcq, R.
dc.contributor.author
Ensslin, K.
dc.contributor.author
Driscoll, D. C.
dc.contributor.author
Gossard, A. C.
dc.date.accessioned
2017-06-08T16:01:38Z
dc.date.available
2017-06-08T16:01:38Z
dc.date.issued
2007
dc.identifier.issn
0268-1242
dc.identifier.issn
1361-6641
dc.identifier.other
10.1088/0268-1242/22/4/007
dc.identifier.uri
http://hdl.handle.net/20.500.11850/2931
dc.language.iso
en
dc.publisher
IOP Publishing
dc.title
Influence of HCl etching on the electronic properties of LAO-defined nanostructures
dc.type
Journal Article
ethz.journal.title
Semiconductor Science and Technology
ethz.journal.volume
22
ethz.journal.issue
4
ethz.journal.abbreviated
Semicond. sci. technol.
ethz.pages.start
337
ethz.pages.end
341
ethz.notes
Received 27 November 2006, Published 23 February 2007.
ethz.identifier.wos
ethz.identifier.nebis
000034381
ethz.publication.place
Bristol
ethz.publication.status
published
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02010 - Dep. Physik / Dep. of Physics::02505 - Laboratorium für Festkörperphysik / Laboratory for Solid State Physics::03439 - Ensslin, Klaus / Ensslin, Klaus
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02010 - Dep. Physik / Dep. of Physics::02505 - Laboratorium für Festkörperphysik / Laboratory for Solid State Physics::03439 - Ensslin, Klaus / Ensslin, Klaus
ethz.date.deposited
2017-06-08T16:01:45Z
ethz.source
ECIT
ethz.identifier.importid
imp59364b5c6ff0830550
ethz.ecitpid
pub:12889
ethz.eth
yes
ethz.availability
Metadata only
ethz.rosetta.installDate
2017-07-15T14:57:03Z
ethz.rosetta.lastUpdated
2024-02-01T14:07:48Z
ethz.rosetta.versionExported
true
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