Conformal Deposition of Metal Silicide Layer on Si Wafer for Transistor Technology via a Molecular Approach

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Author
Date
2018Type
- Doctoral Thesis
ETH Bibliography
yes
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https://doi.org/10.3929/ethz-b-000293820Publication status
publishedExternal links
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Publisher
ETH ZurichOrganisational unit
03872 - Copéret, Christophe / Copéret, Christophe
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ETH Bibliography
yes
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