Conformal Deposition of Metal Silicide Layer on Si Wafer for Transistor Technology via a Molecular Approach

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Author
Lin, Tsung-Han
Date
2018
Type
    Doctoral Thesis
Rights / license
In Copyright - Non-Commercial Use Permitted
Permanent link
https://doi.org/10.3929/ethz-b-000293820
Publication status
published
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Contributors
Examiner: Copéret, Christophe
Examiner: Wood, Vanessacc
Examiner: Shih, C.-J.
Publisher
ETH Zurich
Organisational unit
03872 - Copéret, Christophe / Copéret, Christophe  
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