Deposition of SiOx diffusion barriers on flexible packaging materials by PECVD

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Author
Bieder, Andrea
Grüniger, A.
Rudolf von Rohr, Philipp
Date
2005-10
Type
  • Conference Paper
Publication status
published
External links
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Journal / series
Surface & coatings technology
Volume
200(1-4)
Pages
928 - 931
Publisher
Elsevier
Event
9th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 13-17, 2004
Subject
Silicon oxide; Diffusion barrier; PECVD; Water vapor permeability; RF mode; Dual mode
Organisational unit
03348 - Rudolf von Rohr, Philipp
Notes
Available online 31 March 2005.
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Citations
Cited 60 times in Web of Science
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