In Situ Measurement and Control of the Fermi Level in Colloidal Nanocrystal Thin Films during Their Fabrication
dc.contributor.author
Volk, Sebastian
dc.contributor.author
Yazdani, Nuri
dc.contributor.author
Yarema, Olesya
dc.contributor.author
Yarema, Maksym
dc.contributor.author
Bozyigit, Deniz
dc.contributor.author
Wood, Vanessa
dc.date.accessioned
2019-12-12T09:03:39Z
dc.date.available
2018-12-29T03:50:11Z
dc.date.available
2019-01-04T16:32:25Z
dc.date.available
2019-11-08T23:00:51Z
dc.date.available
2019-11-11T09:42:58Z
dc.date.available
2019-12-12T09:03:39Z
dc.date.issued
2018-12-20
dc.identifier.issn
1948-7185
dc.identifier.other
10.1021/acs.jpclett.8b03283
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/313366
dc.identifier.doi
10.3929/ethz-b-000313366
dc.format
application/pdf
en_US
dc.language.iso
en
en_US
dc.publisher
American Chemical Society
en_US
dc.rights.uri
http://rightsstatements.org/page/InC-NC/1.0/
dc.subject
in-situ measurement
en_US
dc.subject
electronic structure
en_US
dc.subject
Fermi level
en_US
dc.subject
nanocrystals
en_US
dc.subject
quantum dots
en_US
dc.title
In Situ Measurement and Control of the Fermi Level in Colloidal Nanocrystal Thin Films during Their Fabrication
en_US
dc.type
Journal Article
dc.rights.license
In Copyright - Non-Commercial Use Permitted
dc.date.published
2018-12-10
ethz.journal.title
The Journal of Physical Chemistry Letters
ethz.journal.volume
9
en_US
ethz.journal.issue
24
en_US
ethz.journal.abbreviated
J. Phys. Chem. Lett.
ethz.pages.start
7165
en_US
ethz.pages.end
7172
en_US
ethz.size
32 p. accepted version; 18 p. supporting information
en_US
ethz.version.deposit
acceptedVersion
en_US
ethz.identifier.wos
ethz.identifier.scopus
ethz.publication.place
Washington, DC
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::02634 - Institut für Elektronik / Institute for Electronics::03895 - Wood, Vanessa / Wood, Vanessa
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02140 - Dep. Inf.technologie und Elektrotechnik / Dep. of Inform.Technol. Electrical Eng.::02634 - Institut für Elektronik / Institute for Electronics::03895 - Wood, Vanessa / Wood, Vanessa
en_US
ethz.date.deposited
2018-12-29T03:50:27Z
ethz.source
SCOPUS
ethz.eth
yes
en_US
ethz.availability
Open access
en_US
ethz.date.embargoend
2019-12-10
ethz.rosetta.installDate
2019-01-04T16:32:47Z
ethz.rosetta.lastUpdated
2023-02-06T17:57:33Z
ethz.rosetta.versionExported
true
ethz.COinS
ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.atitle=In%20Situ%20Measurement%20and%20Control%20of%20the%20Fermi%20Level%20in%20Colloidal%20Nanocrystal%20Thin%20Films%20during%20Their%20Fabrication&rft.jtitle=The%20Journal%20of%20Physical%20Chemistry%20Letters&rft.date=2018-12-20&rft.volume=9&rft.issue=24&rft.spage=7165&rft.epage=7172&rft.issn=1948-7185&rft.au=Volk,%20Sebastian&Yazdani,%20Nuri&Yarema,%20Olesya&Yarema,%20Maksym&Bozyigit,%20Deniz&rft.genre=article&rft_id=info:doi/10.1021/acs.jpclett.8b03283&
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