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dc.contributor.author
Brandstätter, Markus
dc.contributor.author
Weber, Marco M.
dc.contributor.author
Hudgins, Duane
dc.contributor.author
Nickol, Jeremy B.
dc.contributor.author
Alickaj, Flori
dc.contributor.author
Abhari, Reza S.
dc.date.accessioned
2019-04-04T09:09:50Z
dc.date.available
2019-01-14T14:53:06Z
dc.date.available
2019-04-04T09:09:50Z
dc.date.issued
2017
dc.identifier.other
https://doi.org/10.1117/12.2280597
en_US
dc.identifier.uri
http://hdl.handle.net/20.500.11850/315623
dc.language.iso
en
en_US
dc.publisher
SPIE - The International Society for Optical Engineering
en_US
dc.title
Improved cost-of-ownership for a droplet-based LPP light source for HVM EUV mask and blank inspection
en_US
dc.type
Other Conference Item
dc.date.published
2017-10-16
ethz.size
16 p.
en_US
ethz.event
SPIE Photomask Technology and EUV Lithography 2017
en_US
ethz.event.location
Monterey, CA, USA
en_US
ethz.event.date
September 11-14, 2017
en_US
ethz.publication.place
s.l.
en_US
ethz.publication.status
published
en_US
ethz.leitzahl
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology::03548 - Abhari, Reza S. / Abhari, Reza S.
en_US
ethz.leitzahl.certified
ETH Zürich::00002 - ETH Zürich::00012 - Lehre und Forschung::00007 - Departemente::02130 - Dep. Maschinenbau und Verfahrenstechnik / Dep. of Mechanical and Process Eng.::02627 - Institut für Energietechnik / Institute of Energy Technology::03548 - Abhari, Reza S. / Abhari, Reza S.
en_US
ethz.date.deposited
2019-01-14T14:53:21Z
ethz.source
FORM
ethz.eth
yes
en_US
ethz.availability
Metadata only
en_US
ethz.rosetta.installDate
2019-04-04T09:09:56Z
ethz.rosetta.lastUpdated
2019-04-04T09:09:56Z
ethz.rosetta.exportRequired
false
ethz.rosetta.versionExported
true
ethz.COinS
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